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MDA-12SA article
MDA-12SA
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Motorized joystick control
Microscope position control system
Enable Ceramic substrate for Bump
 
Photo-litho / Exposure System / Manual - MDA-12SA

 

  • specification
     
    • Type Semi-Auto (Joystick control)
    Mask size up to 13" x 13"
    Substrate size piece to 12" x 12"
    UV lamp & Power 2kW & power supply
    5kW & Power supply
    Uniform beam size 13.25" x 13.25"
    Beam Uniformity <±5%
    Beam wavelength 350 ~ 450nm
    365nm Intensity 15 ~ 20mW/cm2 (2kW)
    25 ~ 60mW/cm2 (5kW)
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ (Motorized)
    Frame Anti-Vibration system
    Options
    CCD BSA
    UV Intensity meter
    etc.

 

 



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Mask Aligner and Spin Coater equipment
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