MDA-40FA ![article](lib_icon/icon0001.gif)
MDA-40FA |
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Microscope position control system
Auto Align mark searching function |
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![Photo-litho / Exposure System / Auto - MDA-40FA](http://www.midas-system.com/filebox/products_en/76bbc3822177697532b0d688e3bf7426)
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- specification
Type |
Full automatic |
Mask size |
up to 5" x 5" |
Substrate size |
2", 4" |
UV lamp & Power |
350W & power supply |
Uniform beam size |
6.25" x 6.25" |
Beam Uniformity |
<±3% |
Beam wavelength |
350 ~ 450nm |
365nm Intensity |
~25mW/cm2 |
Alignment accuracy |
1um |
Process resolution |
1um@1um PR thickness with vacuum contact |
Process mode |
Soft, Hard, Vacuum contact & Proximity |
Substrate chuck moving |
x,y,z & θ (Motorized) |
Pre-aligner |
±50um |
Frame |
Anti-Vibration system |
Options |
UV Intensity meter |
UV-LED(365nm) exposure module |
etc. |
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Mask Aligner and Spin Coater equipment