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MDA-40FA article
MDA-40FA
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Microscope position control system
Auto Align mark searching function
 
Photo-litho / Exposure System / Auto - MDA-40FA

 

  • specification
     
  • Type Full automatic
    Mask size up to 5" x 5"
    Substrate size 2", 4"
    UV lamp & Power 350W & power supply
    Uniform beam size 6.25" x 6.25"
    Beam Uniformity <±3%
    Beam wavelength 350 ~ 450nm
    365nm Intensity ~25mW/cm2
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ (Motorized)
    Pre-aligner ±50um
    Frame Anti-Vibration system
    Options
    UV Intensity meter
    UV-LED(365nm) exposure module
    etc.

 

 




Mask Aligner and Spin Coater equipment




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