MDA-60MS ![article](lib_icon/icon0001.gif)
MDA-60MS |
Easy operation & Installation
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes |
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![Photo-litho / Exposure System / Manual - MDA-60MS](http://www.midas-system.com/filebox/products_en/15142bce228291b1366d762de9fb679e)
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- specification
Type |
Manual (PC control) |
Mask size |
up to 7" x 7" |
Substrate size |
piece to 6" x 6" |
UV lamp & Power |
1kW & power supply |
Uniform beam size |
7.25" x 7.25" |
Beam Uniformity |
<±5% |
Beam wavelength |
350 ~ 450nm |
365nm Intensity |
15 ~ 25mW/cm2 |
Alignment accuracy |
1um |
Process resolution |
1um@1um PR thickness with vacuum contact |
Process mode |
Soft, Hard, Vacuum contact & Proximity |
Substrate chuck moving |
x,y(Manual), z, θ (Motorized) |
Options |
CCD BSA |
UV Intensity meter |
etc. |
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Frame |
Anti vibration table |
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Mask Aligner and Spin Coater equipment