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MDA-60MS article
MDA-60MS
Easy operation & Installation
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
 
Photo-litho / Exposure System / Manual - MDA-60MS

 

  • specification
     
    • Type Manual (PC control)
    Mask size up to 7" x 7"
    Substrate size piece to 6" x 6"
    UV lamp & Power 1kW & power supply
    Uniform beam size 7.25" x 7.25"
    Beam Uniformity <±5%
    Beam wavelength 350 ~ 450nm
    365nm Intensity 15 ~ 25mW/cm2
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y(Manual), z, θ (Motorized)
    Options
    CCD BSA
    UV Intensity meter
    etc.
    Frame Anti vibration table

 

 



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Mask Aligner and Spin Coater equipment
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