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MDA-80FA article
MDA-80FA
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Microscope position control system
Auto Align mark searching function
 
Photo-litho / Exposure System / Auto - MDA-80FA

 

  • specification
     
    • Type Full automatic
    Mask size up to 9" x 9"
    Substrate size 8"
    UV lamp & Power 2kW & power supply
    Uniform beam size 10.25" x 10.25"
    Beam Uniformity <±5%
    Beam wavelength 350 ~ 450nm
    365nm Intensity ~25mW/cm2
    Alignment accuracy 1um
    Process resolution 1um@1um PR thickness with vacuum contact
    Process mode Soft, Hard, Vacuum contact & Proximity
    Substrate chuck moving x,y,z & θ (Motorized)
    Pre-aligner ±50um
    Frame Anti-Vibration system
    Options UV Intensity meter
    etc.

 

 



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Mask Aligner and Spin Coater equipment
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